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Quartz Mask
Quartz Mask is based on highly pure quartz glass, which has such advantages as a high transmission rate, high flatness, low coefficient of expansion.. It is usually applied to high-precision mask products. Quartz Mask is mainly applied in the field of semiconductor, including Analog ICs, various discrete devices, MEMS, and FPD.

We provide a variety of sizes and specifications of mask products,which covers 130nm, 180nm, 250nm, 350nm, 500nm,500nm and above semiconductor process nodes, as shown in the following table:
ITEM Rank S Y A B C D E F G H I
Design Rule (μm) >5 2-5 1-2 1.0 0.8 0.5 0.35 0.25 0.18 0.15 0.13
CD Tolerance (±μm) ±0.5 ±0.3 ±0.2 ±0.15 ±0.1 ±0.075 ±0.05 ±0.04 ±0.03 ±0.025 ±0.02
CD Range (μm) ≤0.5 ≤0.3 ≤0.2 ≤0.15 ≤0.1 ≤0.07 ≤0.05 ≤0.04 ≤0.035 ≤0.03 ≤0.025
CD mean to target (μm) ±0.5 ±0.3 ±0.2 ±0.15 ±0.1 ±0.07 ±0.04 ±0.03 ≤0.03 ±0.02 ±0.02
Registration & Overlay Based on the 1st layer(μm) ±0.5 ±0.3 ±0.2 ±0.15 ±0.12 ±0.10 ±0.07 ±0.05 ≤0.04 ±0.03 ±0.02
Defect Defect size(μm) <4.0 <2.0 <1.0 <1.0 <0.75 <0.5 <0.4 <0.3 <0.3 <0.25 <0.2

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